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Influence of Aluminum Doping on Structural and Optical Properties of the Nanostructured Copper Oxide Thin Films Prepared by CSP Method

Rafah Mohammed Thyab1, Muntadher Abdulabbas Hasan Al-Hilo2, Fares A. Yasseen3, Heba Alshater4,
Elsayed Gado Blall5, Mohamed A. Abdel-Lateef6*

Abstract
Nanostructured CuO and CuO: Al+3 films were grown at various doping conditions via the chemical spray pyrolysis
method (CSP). The crystallite size of the grown films obtained by XRD was (12.13-13.84) nm, the microstrain increased
from 23.25 to 26.15. The topography of films was studied via AFM. The average diameter was noticed as (57.38),
(69.45), and (75.38) nm for the (CuO, CuO: 2% Al3+ and CuO: 4% Al3+) respectively. A UV-Vis spectral analysis gained
optical properties. The bandgap values in the range of (1.72-1.92) eV with the increase of Al3+ content. The absorption
coefficient increases by aluminum doping. At the same time, the refractive index and Extinction coefficient increases
with aluminum content. This result is beneficial for transparent thin films used for optoelectronic devices applications

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